Publication | Closed Access

Comparison between SiO2 films deposited by atomic layer deposition with SiH2[N(CH3)2]2 and SiH[N(CH3)2]3 precursors

EngineeringNanoelectronicsSilicon On InsulatorSurface ScienceApplied PhysicsSiliceneChemistryThin FilmsChemical DepositionSio2 FilmsChemical Vapor DepositionAtomic Layer DepositionThin Film Processing