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Passivation of the dominant deep level (EL2) in GaAs by hydrogen
110
Citations
13
References
1982
Year
SemiconductorsSemiconductor TechnologyElectrical EngineeringSingle CrystalsEngineeringCrystalline DefectsPhysicsAntisite Asga DefectApplied PhysicsQuantum MaterialsCondensed Matter PhysicsPassivation ProcessSemiconductor MaterialHydrogenDominant Deep LevelCompound SemiconductorSemiconductor Device
We showed that hydrogen incorporated into single crystals of GaAs (by exposure of the crystals to hydrogen plasma) renders the major deep donor level (EL2) located at 0.82 eV below the conduction band at room temperature electronically inert. We attribute this passivation process to the interaction of hydrogen with the unsaturated bonds of the antisite AsGa defect (believed to be responsible for EL2) leading to the formation of stable As–H bonds.
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