Publication | Closed Access
A mechanistic study of SF6/O2 reactive ion etching of molybdenum
25
Citations
0
References
1987
Year
Materials ScienceSurface CharacterizationApplied ChemistryEngineeringNanotechnologyOxide ElectronicsSurface ScienceOxide SemiconductorsApplied PhysicsEtching MechanismSurface AnalysisMechanistic StudyChemistryReactive Ion EtchingMicroelectronicsPlasma EtchingMec Hanism
In this work, the reactive ion etching of Mo by SF6 and O2 has been investigated by studying the etching mec hanism. The etching species, etch products, and Mo surface analysis by x− ray photoemission spectroscopy (XPS or ESCA) and electron energy−loss spectroscopy (EELS) have been analyzed to b etter understand the etching mechanism. (AIP)