Influences of the spacer layer growth temperature on multilayer InAs∕GaAs quantum dot structures

Abstract

The growth temperature of spacer layers (SPLs) is investigated as a means to obtain identical layers for multilayer quantum dot (QD) structures. A 5-layer 1.3-μm InAs∕GaAs QD structure with 50-nm GaAs SPLs served as a model system. It is found that the growth temperature of the GaAs SPLs has pronounced effects on both the structural and optical properties of the InAs QDs. For GaAs SPLs grown at a low temperature of 510°C, dislocations are observed in the second and subsequent layers, a result of significant surface roughness in the underlying spacer layer. However by increasing the growth temperature to 580°C for the final 35nm of the 50-nm GaAs SPLs, a much smoother surface is achieved, allowing the fabrication of essentially identical, defect free QD layers. The suppression of defect formation enhances both the room-temperature photoluminescence efficiency and the performance of 1.3-μm multilayer InAs∕GaAs QD lasers. An extremely low continue-wave room-temperature threshold current density of 39A∕cm2 is achieved for an as-cleaved 5-layer device with emission at 1.306μm and ground state operation up to 100°C.