Cryogenic etching of nano-scale silicon trenches with resist masks - Concepedia

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Cryogenic etching of nano-scale silicon trenches with resist masks

31

Citations

14

References

2010

Year

Y. Wu, Deidre Olynick, Andy Goodyear, Christophe Péroz, Scott Dhuey, Xiaogan Liang, Stefano Cabrini

Microelectronic Engineering

EngineeringMicrofabricationApplied PhysicsCryogenic EtchingElectronic PackagingSilicon On InsulatorMicroelectronicsPlasma EtchingNanolithography Method

References

	Year	Citations

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