High mobility amorphous/nanocrystalline indium zinc oxide deposited at room temperature

References

Page 1

	Year	Citations
Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties K. Ellmer Journal of Physics D Applied Physics Thin Film PhysicsEngineeringThin Film Process TechnologyElectronic PropertiesChemical Deposition	2000	585
Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film Yeon Sik Jung, Ji Yoon Seo, Dong Wook Lee, Thin Solid Films Materials ScienceMagnetismMaterials EngineeringElectrical EngineeringEngineering	2003	212
Comparative study on structure and internal stress in tin-doped indium oxide and indium-zinc oxide films deposited by r.f. magnetron sputtering T. Sasabayashi, Norihiro Ito, E. Nishimura, Thin Solid Films Materials ScienceMagnetismIndium-zinc Oxide FilmsEngineeringOxide Electronics	2003	152
Structural and physical characterisation of transparent conducting pulsed laser deposited In2O3–ZnO thin films Negar Naghavi, Corinne Marcel, L. Dupont, Journal of Materials Chemistry Materials ScienceOxide HeterostructuresIi-vi SemiconductorOptical MaterialsEngineering	2000	120
Transport in high mobility amorphous wide band gap indium zinc oxide films Rodrigo Martins, Pedro Barquinha, Ana Pimentel, physica status solidi (a) Materials ScienceSemiconductorsRoom TemperatureEngineeringCrystalline Defects	2005	119
Characterization of indium zinc oxide thin films prepared by pulsed laser deposition using a Zn3In2O6 target Negar Naghavi, Aline Rougier, Corinne Marcel, Thin Solid Films Materials ScienceEngineeringZn3in2o6 TargetOxide ElectronicsApplied Physics	2000	94
Influence of tin doping on the structural and physical properties of indium–zinc oxides thin films deposited by pulsed laser deposition Negar Naghavi, Corinne Marcel, L. Dupont, Thin Solid Films Materials ScienceEngineeringOxide ElectronicsApplied PhysicsLaser Deposition	2002	20

Page 1