Metal vapor vacuum arc ion sources ‘‘Raduga’’

Abstract

A brief review is presented of the ‘‘Raduga’’ 1–4 repetitively pulsed metal vapor vacuum arc ion sources. Their operation principles and functional ranges are described. The Raduga ion sources provide single- and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Some specific features of the emission properties of broad beam metal vapor vacuum arc ion sources are described.