Publication | Closed Access
A New Model for Threshold Voltage Mismatch Based on the Random Fluctuations of Dopant Number in the MOS Transistor Gate
11
Citations
4
References
2001
Year
Unknown Venue
Device ModelingElectrical EngineeringSemiconductor DeviceEngineeringMos Transistor GatePhysicsNanoelectronicsBias Temperature InstabilityRandom FluctuationsApplied PhysicsDopant NumberMicroelectronicsCircuit Simulation
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