Applied Physics Letters · 2005 · 96 citations · 11 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsOptical MaterialsSemiconductor MaterialsIii-v SemiconductorsLuminescent MaterialsSemiconductor Crystal GrowthSemiconductor DefectsSemiconductor Device MaterialsWide-bandgap SemiconductorsDefect DensityDefect-related LuminescenceGallium Nitride (Gan) MaterialsLuminescence LifetimeMolecular Beam EpitaxyPhotoluminescencePhotoluminescence SpectroscopySpatial Inhomogeneity
AlGaN samples grown by plasma-assisted molecular-beam epitaxy on sapphire (0001) substrates, with 20%–50% Al content and without the use of indium, show intense room-temperature photoluminescence that is significantly redshifted, 200–400meV, from band edge. This intense emission is characterized by a long room-temperature lifetime (∼375ps) comparable to that seen in low defect density (∼108cm−2) GaN. Room-temperature monochromatic cathodoluminescence images at the redshifted peak reveal spatially nonuniform emission similar to that observed in In(Al)GaN alloys and attributed to compositional inhomogeneity. These observations suggest that spatial localization enhances the luminescence efficiency despite the high defect density (>1010cm−2) of the films by inhibiting movement of carriers to nonradiative sites.
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Luminescences from localized states in InGaN epilayers
Shigefusa F. Chichibu, T. Azuhata, T. Sota et al. · Applied Physics Letters · 1997 · 405 citations
Time-resolved photoluminescence studies of AlxGa1−xN alloys
H. S. Kim, R. Mair, J. Li et al. · Applied Physics Letters · 2000 · 121 citations
Natural Sciences, Materials Engineering, Materials Science +17