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Phase-change chalcogenide nonvolatile RAM completely based on CMOS technology
18
Citations
2
References
2004
Year
Unknown Venue
Cell PerturbationElectrical EngineeringNon-volatile MemoryEngineeringSimple Cell StructureNanoelectronicsApplied PhysicsTwin CellSemiconductor MemoryMicroelectronicsPhase Change MemoryPhase-change Chalcogenide
We have integrated a phase-change chalcogenide random access memory, completely based on 0.24 /spl mu/m-CMOS technologies. A twin cell and BL clamping circuits are introduced to enlarge fabrication tolerance and to reduce cell perturbation during reading operation. To draw back current as much as possible, Co salicidation is also applied to transistor formation. By constructing a simple cell structure with Ge/sub 2/Sb/sub 2/Te/sub 5/, we have observed reliable phase-transitions by driving current through MOS transistors. With 100 ns-writing pulses of 2 mA for RESET and 0.6 mA for SET, the device operates successfully with a considerable sensing signal at reading voltage of as low as 0.2 V.
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