Rapid thermal annealing/chemical vapor deposition and integrated processing

Abstract

This volume contains papers presented at the symposium on rapid thermal annealing/chemical vapor deposition and integrated processing. Rapid thermal processing is growing in many directions. The seven sessions presented during this symposium cover recent developments in the traditional RTP subjects such as ion implant annealing in Si and III-V materials, metals processes (silicides and contact alloying), and oxide growth in addition to newer areas of CVD using RTP techniques, integrated processing and complex dielectric structures (such as ONO). Work in all aspects of RTP is progressing and it appears that the integration of rapid thermal processing into manufacturing environments is finally occurring.