Journal of Material Science and Technology · 2009 · 21 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsDopingMetal OxidesOxide SemiconductorsThin Film Electrical PropertiesThin-film DepositionThin-film MaterialsDeposition TechniquesSemiconductor Oxide Thin FilmsSubstrate Temperature EffectsThin Oxide FilmsThin Oxide LayersThin-film OxidesZinc Oxides
Transparent conducting molybdenum-doped zinc oxide (MZO) films were successfully prepared by radio frequency (RF) magnetron sputtering method on glass substrates under different substrate temperatures. The nature of MZO film is polycrystalline with hexagonal structure and a preferred orientation along c-axis. With increasing substrate temperature from room temperature to 400◦C, the crystallinity of the films is deteriorated and the resistivity increases sharply due to both the decrease of carrier concentration and Hall mobility. The lowest resistivity achieved is 9.2×10−4 Ω· cm with a high Hall mobility of 30 cm2·V−1·s−1 for the film deposited at room temperature. The average transmittance in the visible range exceeds 85% for all the samples. The optical band gap decreases from 3.30 to 3.25 eV with substrate temperature from room temperature to 400◦C.