Sulfur Passivation
Sulfur Passivation is a surface passivation technique that utilizes sulfur-based compounds to chemically钝化 semiconductor surfaces by reducing interface states and enhancing electronic stability through the formation of sulfide layers.
365
Publications
14.3K
Citations
1.6K
Authors
464
Institutions
Publications per year
2017–2026
85
Parents
365
1–5 of 365
1.6K
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464

Centre National de la Recherche Scientifique
Paris, France
12 h-index
34 publications
897 citations
Institute for Microstructural Sciences
Ottawa, Canada
11 h-index
27 publications
1.4K citations
National Cheng Kung University
Tainan City, Taiwan
11 h-index
52 publications
997 citations
Fudan University
Shanghai, China
10 h-index
40 publications
1.6K citations
The University of Tokyo
Tokyo, Japan
9 h-index
32 publications
967 citations
Tsinghua University
Beijing, China
9 h-index
37 publications
1.6K citations

Western University
London, Canada
9 h-index
33 publications
901 citations

Chinese Academy of Sciences
Beijing, China
8 h-index
30 publications
946 citations
1–8 of 464
42 publications · 2K citations
26
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21 publications · 580 citations
17
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23 publications · 523 citations
15
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12 publications · 344 citations
12
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JES · 13 publications · 361 citations
12
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