Concepedia

Substrate Biasing

Substrate Biasing is a process control technique in physical vapor deposition wherein an electrical potential is applied to the substrate to selectively influence the energy and trajectory of incident vapor species, thereby modifying the microstructure and properties of the deposited thin film.

140

Publications

4.9K

Citations

522

Authors

193

Institutions

Publications per year

2017–2026

24

Variants

Substrate Bias

Parents

Publications

140

Charged particle fluxes from planar magnetron sputtering sources

B. Window, N. Savvides · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 419 citations

, , +13

Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic-arc deposition with substrate pulse biasing

George M. Pharr, D. L. Callahan, S. D. McAdams et al. · Applied Physics Letters · 1996 · 272 citations

, , +17

Design of a Single-Chip pH Sensor Using a Conventional 0.6-<tex>$muhbox m$</tex>CMOS Process

P.A. Hammond, D. Ali, David R. S. Cumming · IEEE Sensors Journal · 2004 · 130 citations

, , +14

Crystalline alumina deposited at low temperatures by ionized magnetron sputtering

Jochen M. Schneider, William D. Sproul, Andrey A. Voevodin et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 128 citations

, , +17

Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies

Tahsin Faraz, Harm C. M. Knoops, Marcel A. Verheijen et al. · ACS Applied Materials & Interfaces · 2018 · 112 citations · Full text

, , +17

1–5 of 140

Authors

522

  1. WM
    W. M. M. Kessels

    Eindhoven University of Technology, Netherlands

    7 publications · 339 citations

    7

    h-index

  2. TF
    Tahsin Faraz

    Eindhoven University of Technology, Netherlands

    5 publications · 254 citations

    5

    h-index

  3. JM
    Jochen M. Schneider

    RWTH Aachen University, Germany

    4 publications · 231 citations

    4

    h-index

  4. MC
    M. C. M. van de Sanden

    Eindhoven University of Technology, Netherlands

    4 publications · 119 citations

    4

    h-index

  5. BK
    Beng Kang Tay

    Nanyang Technological University, Singapore

    4 publications · 161 citations

    4

    h-index

1–5 of 522

Institutions

193

  1. Centre National de la Recherche Scientifique

    Paris, France

    11 h-index

    38 publications

    1.3K citations

  2. Eindhoven University of Technology

    Eindhoven, The Netherlands

    10 h-index

    40 publications

    2K citations

  3. University of California, Berkeley

    Berkeley, United States

    7 h-index

    15 publications

    437 citations

  4. Nanyang Technological University

    Singapore, Singapore

    6 h-index

    27 publications

    959 citations

  5. City University of Hong Kong

    Hong Kong, Hong Kong

    4 h-index

    10 publications

    192 citations

  6. RWTH Aachen University

    Aachen, Germany

    4 h-index

    8 publications

    289 citations

  7. Texas Instruments (United States)

    Dallas, United States

    4 h-index

    6 publications

    129 citations

  8. Ruhr University Bochum

    Bochum, Germany

    4 h-index

    16 publications

    460 citations

1–8 of 193

Venues

  1. Journal of Applied Physics

    16 publications · 458 citations

    15

    h-index

  2. Applied Physics Letters

    12 publications · 632 citations

    12

    h-index

  3. Thin Solid Films

    9 publications · 209 citations

    9

    h-index

  4. 9

    h-index

  5. Surface and Coatings Technology

    7 publications · 243 citations

    7

    h-index

1–5