Self-assembled Patterning

Self-Assembled Patterning is a thin-film patterning technique that relies on the spontaneous organization of molecules or nanostructures into ordered arrays through intrinsic thermodynamic interactions, distinguishing it from lithographically directed methods by its autonomously driven, bottom-up formation mechanism.

26

Publications

1.6K

Citations

140

Authors

45

Institutions

Publications per year

2017–2026

2

Authors

140

  1. HY
    He Yi

    Stanford University, United States

    4 publications · 149 citations

    4

    h-index

  2. HP
    H.‐S. Philip Wong

    Stanford University, United States

    4 publications · 149 citations

    4

    h-index

  3. QM
    Qiang Ma

    Xijing University, China

    2 publications · 86 citations

    2

    h-index

  4. YM
    Yong Mei Chen

    Xi'an Jiaotong University, China

    2 publications · 63 citations

    2

    h-index

  5. MD
    Martin D. F. Wong

    University of Illinois Urbana-Champaign, United States

    2 publications · 86 citations

    2

    h-index

1–5 of 140

Venues

  1. 5

    h-index

  2. ACS Nano

    2 publications · 175 citations

    2

    h-index

  3. Advanced Materials

    2 publications · 661 citations

    2

    h-index

  4. Journal of Materials Chemistry C

    1 publications · 52 citations

    1

    h-index

  5. The Journal of Physical Chemistry Letters

    1 publications · 45 citations

    1

    h-index

1–5