Concepedia

Sacrificial Layer Planarization

Sacrificial Layer Planarization is a microfabrication technique that belongs to the class of sacrificial layer processing methods, distinguished by its specific purpose of achieving a flat, uniform surface topology through the controlled deposition and subsequent removal of a sacrificial material layer to enable multilayer integration in three-dimensional device architectures.

80

Publications

2.4K

Citations

363

Authors

138

Institutions

Publications per year

2017–2026

11

Parents

Publications

80

Nanocrystalline silicon electron emitter with a high efficiency enhanced by a planarization technique

Katsuhiko Nishiguchi, Xin Zhao, Shunri Oda · Journal of Applied Physics · 2002 · 106 citations

, , +16

Fabrication of silicon condenser microphones using single wafer technology

P.R. Scheeper, A.G.H. van der Donk, Wouter Olthuis et al. · Journal of Microelectromechanical Systems · 1992 · 101 citations · Full text

, , +17

Super-tetragonal Sr <sub>4</sub> Al <sub>2</sub> O <sub>7</sub> as a sacrificial layer for high-integrity freestanding oxide membranes

Jinfeng Zhang, Ting Lin, Xiaochao Wang et al. · Science · 2024 · 96 citations

, , +17

Rendering SU-8 hydrophilic to facilitate use in micro channel fabrication

Maria Nordström, Rodolphe Marie, Montserrat Calleja et al. · Journal of Micromechanics and Microengineering · 2004 · 92 citations

, , +17

A novel sacrificial interlayer-based method for the preparation of silicon carbide membranes

Bahman Elyassi, Muhammad Sahimi, Theodore T. Tsotsis · Journal of Membrane Science · 2007 · 82 citations

, , +14

1–5 of 80

Authors

363

  1. MG
    Mark G. Allen

    Georgia Institute of Technology, United States

    3 publications · 106 citations

    3

    h-index

  2. TS
    T. Satoh

    NEC (Japan), Japan

    3 publications · 92 citations

    3

    h-index

  3. KH
    K. Hinode

    Hitachi (Japan), Japan

    3 publications · 92 citations

    3

    h-index

  4. YK
    Yoshihiro Kitagawa

    Kyoto Prefectural University of Medicine, Japan

    3 publications · 92 citations

    3

    h-index

  5. SN
    S. Nagasawa

    International Superconductivity Technology Center, Japan

    3 publications · 92 citations

    3

    h-index

1–5 of 363

Institutions

138

  1. Chinese Academy of Sciences

    Beijing, China

    5 h-index

    14 publications

    585 citations

  2. Centre National de la Recherche Scientifique

    Paris, France

    3 h-index

    11 publications

    251 citations

  3. Simon Fraser University

    Burnaby, Canada

    3 h-index

    10 publications

    444 citations

  4. Tsinghua University

    Beijing, China

    3 h-index

    5 publications

    165 citations

  5. Samsung (South Korea)

    Seoul, South Korea

    3 h-index

    11 publications

    123 citations

  6. International Superconductivity Technology Center

    Kawasaki, Japan

    3 h-index

    17 publications

    488 citations

  7. IMEC

    Leuven, Belgium

    2 h-index

    10 publications

    210 citations

  8. Georgia Institute of Technology

    Atlanta, United States

    2 h-index

    3 publications

    55 citations

1–8 of 138

Venues

  1. Journal of Micromechanics and Microengineering

    JMM · 15 publications · 557 citations

    13

    h-index

  2. 4

    h-index

  3. Microelectronic Engineering

    3 publications · 84 citations

    3

    h-index

  4. Thin Solid Films

    3 publications · 49 citations

    3

    h-index

  5. Sensors and Actuators A Physical

    2 publications · 88 citations

    2

    h-index

1–5