Resolution Enhancement Techniques

Resolution Enhancement Techniques is a lithographic optimization strategy that belongs to the class of patterning improvement methods, distinguished by its specific focus on enabling sub-wavelength feature definition through computational, optical, or process-based modifications to extend the resolution limits of photolithography systems.

974

Publications

43.9K

Citations

3.2K

Authors

913

Institutions

Publications per year

2017–2026

217

Variants

Ret

Authors

3.2K

  1. XM
    Xu Ma

    Beijing Institute of Technology, China

    15 publications · 534 citations

    13

    h-index

  2. YL
    Yanqiu Li

    Beijing Institute of Technology, China

    9 publications · 214 citations

    9

    h-index

  3. GR
    Gonzalo R. Arce

    University of Delaware, United States

    9 publications · 421 citations

    9

    h-index

  4. BY
    Bei Yu

    Chinese University of Hong Kong, Hong Kong SAR China

    8 publications · 341 citations

    8

    h-index

  5. LW
    Lars W. Liebmann

    IBM (United States), United States

    7 publications · 363 citations

    7

    h-index

1–5 of 3.2K

Venues

  1. Optics Express

    64 publications · 2.7K citations

    32

    h-index

  2. 27

    h-index

  3. 20

    h-index

  4. Optics Letters

    21 publications · 1K citations

    18

    h-index

  5. Applied Spectroscopy

    21 publications · 758 citations

    17

    h-index

1–5