Pattern Uniformity

Pattern Uniformity is a metric in thin-film patterning that quantifies the consistency of feature dimensions and spatial arrangement across a substrate, distinguishing it from other patterning metrics by specifically evaluating the deviation from ideal uniformity in replicated micro- or nano-scale patterns.

178

Publications

7.8K

Citations

868

Authors

240

Institutions

Publications per year

2017–2026

50

Authors

868

  1. HL
    Haiou Lu

    University Town of Shenzhen, China

    3 publications · 137 citations

    3

    h-index

  2. CG
    C. Gourgon

    Centre National de la Recherche Scientifique, France

    3 publications · 67 citations

    3

    h-index

  3. XL
    Xinghui Li

    Tsinghua University, China

    3 publications · 137 citations

    3

    h-index

  4. LJ
    L. Jay Guo

    University of Michigan, United States

    3 publications · 267 citations

    3

    h-index

  5. QZ
    Qian Zhou

    Tsinghua University, China

    3 publications · 137 citations

    3

    h-index

1–5 of 868

Venues

  1. Applied Physics Letters

    11 publications · 599 citations

    11

    h-index

  2. 10

    h-index

  3. Optics Express

    8 publications · 317 citations

    8

    h-index

  4. Journal of Micromechanics and Microengineering

    JMM · 6 publications · 208 citations

    6

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 6 publications · 86 citations

    6

    h-index

1–5