Pattern Uniformity
Pattern Uniformity is a metric in thin-film patterning that quantifies the consistency of feature dimensions and spatial arrangement across a substrate, distinguishing it from other patterning metrics by specifically evaluating the deviation from ideal uniformity in replicated micro- or nano-scale patterns.
178
Publications
7.8K
Citations
868
Authors
240
Institutions
Publications per year
2017–2026
50
Parents
178
Wafer-Scale Highly Oriented Monolayer MoS<sub>2</sub> with Large Domain Sizes
Qinqin Wang, Na Li, Jian Tang et al. · Nano Letters · 2020 · 268 citations
1–5 of 178
868
3
h-index
3
h-index
3
h-index
3
h-index
3
h-index
1–5 of 868
240
University of Michigan
Ann Arbor, United States
6 h-index
24 publications
1.6K citations
Seoul National University
Seoul, South Korea
5 h-index
22 publications
977 citations

National Taiwan University
Taipei, Taiwan
5 h-index
13 publications
285 citations
Korea Institute of Science and Technology
Seoul, South Korea
4 h-index
7 publications
287 citations

Chinese Academy of Sciences
Beijing, China
4 h-index
24 publications
4.7K citations
Dalian University
Dalian, China
3 h-index
16 publications
1.7K citations
Institute of Materials Research and Engineering
Singapore, Singapore
3 h-index
10 publications
1.2K citations
The University of Texas at Austin
Austin, United States
3 h-index
8 publications
162 citations
1–8 of 240
11 publications · 599 citations
11
h-index
10 publications · 336 citations
10
h-index
8 publications · 317 citations
8
h-index
JMM · 6 publications · 208 citations
6
h-index
JJAP · 6 publications · 86 citations
6
h-index
1–5