Native Oxide Passivation

Native Oxide Passivation is a surface passivation method in semiconductor physics wherein the native oxide layer that spontaneously forms on a material’s surface under ambient conditions acts as a dielectric barrier that reduces surface recombination by chemically stabilizing dangling bonds at the interface.

249

Publications

11.6K

Citations

1.1K

Authors

307

Institutions

Publications per year

2017–2026

44

Authors

1.1K

  1. CL
    Ching-Ting Lee

    National Cheng Kung University, Taiwan

    5 publications · 208 citations

    5

    h-index

  2. CL
    Christopher L. Hinkle

    The University of Texas at Dallas, United States

    4 publications · 310 citations

    4

    h-index

  3. BB
    Barry Brennan

    The University of Texas at Dallas, United States

    4 publications · 310 citations

    4

    h-index

  4. YL
    Yow-Jon Lin

    National Changhua University of Education, Taiwan

    4 publications · 181 citations

    4

    h-index

  5. TC
    Thierry Conard

    IMEC, Belgium

    4 publications · 88 citations

    4

    h-index

1–5 of 1.1K

Venues

  1. Applied Physics Letters

    43 publications · 2.5K citations

    25

    h-index

  2. Journal of The Electrochemical Society

    JES · 18 publications · 615 citations

    13

    h-index

  3. Journal of Applied Physics

    16 publications · 407 citations

    12

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 13 publications · 371 citations

    12

    h-index

  5. 12

    h-index

1–5