Concepedia

Interfacial Contamination

Interfacial Contamination is a phenomenon in wafer bonding characterized by the presence of unwanted substances at the bonding interface, which distinguishes it from other bonding defects by directly impairing atomic adhesion and interfacial integrity between the joined substrates.

59

Publications

2.6K

Citations

265

Authors

97

Institutions

Publications per year

2017–2026

8

Parents

Publications

59

Room temperature Cu–Cu direct bonding using surface activated bonding method

T. H. Kim, M.M.R. Howlader, Toshihiro Itoh et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2003 · 335 citations

, , +15

Seed Crystal Homogeneity Controls Lateral and Vertical Heteroepitaxy of Monolayer MoS<sub>2</sub> and WS<sub>2</sub>

Youngdong Yoo, Zachary P. Degregorio, James E. Johns · Journal of the American Chemical Society · 2015 · 167 citations

, , +17

Growth-substrate induced performance degradation in chemically synthesized monolayer MoS2 field effect transistors

Matin Amani, Matthew L. Chin, Alexander L. Mazzoni et al. · Applied Physics Letters · 2014 · 119 citations

, , +17

Key Durability Issues With Mullite-Based Environmental Barrier Coatings for Si-Based Ceramics

Kang N. Lee · Journal of Engineering for Gas Turbines and Power · 2000 · 113 citations

, , +17

Direct Chemical Vapor Deposition Growth and Band-Gap Characterization of MoS<sub>2</sub>/<i>h</i>-BN van der Waals Heterostructures on Au Foils

Zhepeng Zhang, Xujing Ji, Jianping Shi et al. · ACS Nano · 2017 · 106 citations

, , +17

1–5 of 59

Authors

265

  1. SS
    Susanne Stemmer

    University of California, Santa Barbara, United States

    2 publications · 68 citations

    2

    h-index

  2. ZW
    Zefeng Wen

    Southwest Jiaotong University, China

    2 publications · 42 citations

    2

    h-index

  3. KN
    Kang N. Lee

    Glenn Research Center, United States

    2 publications · 140 citations

    2

    h-index

  4. TO
    Tadahiro Ohmi

    Tohoku University, Japan

    2 publications · 30 citations

    2

    h-index

  5. TW
    Tao Wu

    Soochow University, China

    2 publications · 42 citations

    2

    h-index

1–5 of 265

Institutions

97

  1. Tohoku University

    Sendai, Japan

    3 h-index

    9 publications

    426 citations

  2. Cleveland State University

    Cleveland, United States

    2 h-index

    2 publications

    140 citations

  3. University of Minnesota

    Minneapolis, United States

    2 h-index

    6 publications

    558 citations

  4. Soochow University

    Suzhou, China

    2 h-index

    2 publications

    42 citations

  5. University of California, Santa Barbara

    Santa Barbara, United States

    2 h-index

    7 publications

    271 citations

  6. Southwest Jiaotong University

    Chengdu, China

    2 h-index

    8 publications

    168 citations

  7. Texas Instruments (United States)

    Dallas, United States

    2 h-index

    9 publications

    316 citations

  8. Pacific Northwest National Laboratory

    Richland, United States

    1 h-index

    2 publications

    94 citations

1–8 of 97

Venues

  1. Applied Physics Letters

    4 publications · 196 citations

    4

    h-index

  2. Journal of The Electrochemical Society

    JES · 3 publications · 148 citations

    3

    h-index

  3. Journal of Applied Physics

    3 publications · 97 citations

    3

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 2 publications · 106 citations

    2

    h-index

  5. Physics of Fluids

    2 publications · 71 citations

    2

    h-index

1–5