Doping Behavior
Doping Behavior is a material modification strategy in amorphous electronic materials that refers to the controlled introduction of impurities to alter electrical properties, distinguished by its reliance on localized electronic states rather than long-range crystalline order.
811
Publications
37.2K
Citations
3.7K
Authors
996
Institutions
Publications per year
2017–2026
250
811
Tim O. Wehling, Kostya S. Novoselov, M. I. Katsnelson et al. · Nano Letters · 2007 · 1.1K citations · Full text
Substitutional doping of amorphous silicon
P. G. Le Comber · Solid State Communications · 1975 · 1.1K citations
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Commissariat à l'Énergie Atomique et aux Énergies Alternatives, France
3 publications · 155 citations
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Chinese Academy of Sciences
Beijing, China
21 h-index
134 publications
5.4K citations

Centre National de la Recherche Scientifique
Paris, France
15 h-index
41 publications
2.5K citations
The University of Tokyo
Tokyo, Japan
11 h-index
48 publications
2.2K citations
University of Chinese Academy of Sciences
Beijing, China
11 h-index
35 publications
1.5K citations
University of Cambridge
Cambridge, United Kingdom
10 h-index
20 publications
2.1K citations

Tohoku University
Sendai, Japan
10 h-index
25 publications
462 citations

National Laboratory of the Rockies
Golden, United States
9 h-index
29 publications
3.9K citations

National Institute of Advanced Industrial Science and Technology
Tsukuba, Japan
8 h-index
23 publications
1.4K citations
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60 publications · 3.9K citations
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41 publications · 3.1K citations
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PRB · 25 publications · 1.5K citations
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15 publications · 460 citations
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JJAP · 21 publications · 468 citations
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