Doping Behavior

Doping Behavior is a material modification strategy in amorphous electronic materials that refers to the controlled introduction of impurities to alter electrical properties, distinguished by its reliance on localized electronic states rather than long-range crystalline order.

811

Publications

37.2K

Citations

3.7K

Authors

996

Institutions

Publications per year

2017–2026

250

Authors

3.7K

  1. DS
    Damir Sekulić

    University of Split, Croatia

    7 publications · 179 citations

    7

    h-index

  2. JR
    John Robertson

    University of Cambridge, United Kingdom

    5 publications · 520 citations

    5

    h-index

  3. KI
    K. Irmscher

    Leibniz Institute for Crystal Growth, Germany

    4 publications · 342 citations

    4

    h-index

  4. BD
    B. De Salvo

    Commissariat à l'Énergie Atomique et aux Énergies Alternatives, France

    3 publications · 155 citations

    3

    h-index

  5. AZ
    Alex Zunger

    National Laboratory of the Rockies, United States

    3 publications · 968 citations

    3

    h-index

1–5 of 3.7K

Venues

  1. Applied Physics Letters

    60 publications · 3.9K citations

    36

    h-index

  2. Journal of Applied Physics

    41 publications · 3.1K citations

    23

    h-index

  3. Physical review. B, Condensed matter

    PRB · 25 publications · 1.5K citations

    17

    h-index

  4. Journal of Alloys and Compounds

    15 publications · 460 citations

    14

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 21 publications · 468 citations

    14

    h-index

1–5