Direct Write Patterning

Direct Write Patterning is a thin-film patterning technique that belongs to the class of additive, maskless fabrication methods, distinguished by its direct deposition or modification of material at predefined locations through focused energy or material beams without the need for photomasks or etching processes.

109

Publications

9.2K

Citations

475

Authors

157

Institutions

Publications per year

2017–2026

18

Authors

475

  1. JA
    Jennifer A. Lewis

    University of Illinois Urbana-Champaign, United States

    10 publications · 3.6K citations

    10

    h-index

  2. CA
    Chad A. Mirkin

    Northwestern University, United States

    5 publications · 748 citations

    5

    h-index

  3. JL
    Jung‐Hyurk Lim

    Korea National University of Transportation, South Korea

    4 publications · 315 citations

    4

    h-index

  4. WW
    Willie Wu

    University of Illinois Urbana-Champaign, United States

    2 publications · 382 citations

    2

    h-index

  5. OA
    Omkar A. Nafday

    Texas Tech University, United States

    2 publications · 93 citations

    2

    h-index

1–5 of 475

Venues

  1. Advanced Materials

    6 publications · 1.1K citations

    6

    h-index

  2. Applied Physics Letters

    4 publications · 143 citations

    4

    h-index

  3. Chemistry of Materials

    4 publications · 124 citations

    4

    h-index

  4. MRS Proceedings

    3 publications · 67 citations

    3

    h-index

  5. ACS Applied Materials & Interfaces

    3 publications · 83 citations

    3

    h-index

1–5