Damage Recovery

Damage Recovery is a methodological framework in ion implantation that systematically characterizes and mitigates crystal lattice defects through controlled thermal or non-thermal annealing processes to restore semiconductor material properties.

219

Publications

7.5K

Citations

847

Authors

297

Institutions

Publications per year

2017–2026

51

Authors

847

  1. EA
    E. Alves

    University of Lisbon, Portugal

    7 publications · 294 citations

    7

    h-index

  2. KL
    K. Lorenz

    University of Lisbon, Portugal

    6 publications · 235 citations

    6

    h-index

  3. SJ
    S. J. Pearton

    University of Florida, United States

    6 publications · 260 citations

    6

    h-index

  4. AT
    A. Turos

    National Centre for Nuclear Research, Poland

    5 publications · 84 citations

    5

    h-index

  5. HM
    Hj. Matzke

    Joint Research Centre, Germany

    5 publications · 78 citations

    5

    h-index

1–5 of 847

Venues

  1. Journal of Applied Physics

    24 publications · 913 citations

    18

    h-index

  2. Applied Physics Letters

    20 publications · 639 citations

    15

    h-index

  3. Radiation Effects

    12 publications · 329 citations

    12

    h-index

  4. 11

    h-index

  5. PubMed

    Repository · 8 publications · 459 citations

    8

    h-index

1–5