Conformality

Conformality is a thin-film deposition characteristic that denotes the uniform replication of the substrate's topography by the deposited film, distinguishing it from planar or non-uniform film growth mechanisms.

401

Publications

22.8K

Citations

1.3K

Authors

474

Institutions

Publications per year

2017–2026

104

Authors

1.3K

  1. SJ
    Stanley J. Brodsky

    SLAC National Accelerator Laboratory, United States

    22 publications · 1.3K citations

    18

    h-index

  2. XW
    Xing-Gang Wu

    Chongqing University, China

    27 publications · 1.2K citations

    18

    h-index

  3. WM
    W. M. M. Kessels

    Eindhoven University of Technology, Netherlands

    11 publications · 958 citations

    11

    h-index

  4. JS
    Jian-Ming Shen

    Chongqing University, China

    11 publications · 253 citations

    11

    h-index

  5. SW
    Sheng-Quan Wang

    Chongqing University, China

    14 publications · 324 citations

    11

    h-index

1–5 of 1.3K

Venues

  1. Journal of High Energy Physics

    JHEP · 18 publications · 1.4K citations

    16

    h-index

  2. Journal of The Electrochemical Society

    JES · 18 publications · 1.2K citations

    16

    h-index

  3. 14

    h-index

  4. Physics Letters B

    13 publications · 949 citations

    13

    h-index

  5. 13

    h-index

1–5