Wang-Cheng Shih

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Active since

2016

Affiliations

Wang-Cheng Shih is an author at Tokyo Institute of Technology specializing in metal-oxide-semiconductor field-effect transistors, dielectric permittivity, and electrical engineering.

Publications per year

2016–2016

Publications

Improved linearity and reliability in GaN metal–oxide–semiconductor high-electron-mobility transistors using nanolaminate La2O3/SiO2 gate dielectric

Ching‐Hsiang Hsu, Wang-Cheng Shih, Yueh-Chin Lin et al. · Japanese Journal of Applied Physics · 2016 · 15 citations

Engineering, Electrical Engineering, Materials Science +16

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