I. Dói

Titanium nitride as electrode for MOS technology and Schottky diode: Alternative extraction method of titanium nitride work function

Lucas Petersen Barbosa Lima, J. A. Diniz, I. Dói et al. · Microelectronic Engineering · 2011 · 85 citations

Materials Science, Electrical Engineering, Engineering +7

Highly stable hydrophilic surfaces of PDMS thin layer obtained by UV radiation and oxygen plasma treatments

Cleuson de Menezes Atayde, I. Dói · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2009 · 81 citations

Engineering, Surface Nanotechnology, Chemistry +21

Electrical characterization and morphological properties of AlN films prepared by dc reactive magnetron sputtering

M.A. Moreira, I. Dói, Joao Furtado de Souza et al. · Microelectronic Engineering · 2010 · 62 citations

Materials Science, Materials Engineering, Electrical Engineering +11

Micro-Raman stress characterization of polycrystalline silicon films grown at high temperature

Ricardo Cotrin Teixeira, I. Dói, M.B.P. Zakia et al. · Materials Science and Engineering B · 2004 · 52 citations

Materials Science, Engineering, High Temperature +8

Thin titanium oxide films deposited by e-beam evaporation with additional rapid thermal oxidation and annealing for ISFET applications

Anerise de Barros, K.F. Albertin, Juliana Harumi Miyoshi et al. · Microelectronic Engineering · 2009 · 44 citations

Materials Science, Materials Engineering, Electrical Engineering +8