K. G. Y. Letourneur

Detection of CH in an expanding argon/acetylene plasma using cavity ring down absorption spectroscopy

R. Engeln, K. G. Y. Letourneur, M. G. H. Boogaarts et al. · Chemical Physics Letters · 1999 · 66 citations

Natural Sciences, Chemistry, Physics +14

Argon ion-induced dissociation of acetylene in an expanding Ar/C2H2 plasma

Anneke de Graaf, Maikel F. A. M. van Hest, M. C. M. van de Sanden et al. · Applied Physics Letters · 1999 · 36 citations · Full text

Natural Sciences, Chemistry, Physics +15

Stripping of photoresist using a remote thermal Ar/O2 and Ar/N2/O2 plasma

G. J. H. Brussaard, K. G. Y. Letourneur, M. Schaepkens et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 35 citations · Full text

Engineering, Materials Engineering, Materials Science +16

Plasma chemistry during deposition of a-C:H

Jan Benedikt, K. G. Y. Letourneur, M. Wisse et al. · Diamond and Related Materials · 2002 · 33 citations

Natural Sciences, Materials Science, Physics +10

Plasma chemistry of an expanding Ar/C2H2 plasma used for fast deposition of a-C:H

M. C. M. van de Sanden, Maikel F. A. M. van Hest, Anneke de Graaf et al. · Diamond and Related Materials · 1999 · 25 citations

Natural Sciences, Materials Science, Physics +15