Nobuyoshi Awaya Nobuyoshi Awaya

Author

NTT Basic Research Laboratories

Also Known As

Nobuyoshi Awaya Nobuyoshi Awaya

Publications

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NTT Basic Research Laboratories

About

Nobuyoshi Awaya Nobuyoshi Awaya is an author at NTT Basic Research Laboratories specializing in chemical engineering, engineering, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	2	2	84
2	Chemical Engineering	2	2	84
3	Applied Physics	1	1	45
4	Chemistry	1	1	39
5	Electrical Engineering	1	1	45

Nobuyoshi Awaya Nobuyoshi Awaya

Publications

Citations

H-Index

Page 1

	Year	Citations
Plasma-Enhanced Chemical Vapor Deposition of Copper Nobuyoshi Awaya Nobuyoshi Awaya, Yoshinobu Arita Japanese Journal of Applied Physics Materials ScienceChemical EngineeringElectrical EngineeringEngineeringPlasma Processing	1991	45
Accelerated-Deposition Rate and High-Quality Film Copper Chemical Vapor Deposition Using a Water Vapor Addition to a Hydrogen and Cu(HFA)<sub>2</sub> Reaction System Nobuyoshi Awaya Nobuyoshi Awaya, Yoshinobu Arita Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringChemical EngineeringWater Vapor AdditionEngineering	1993	39

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