W. J. Maeng - Concepedia

Concepedia

Author

W. J. Maeng

Pohang University of Science and Technology

Also Known As

Maeng, W., W J Maeng, W. J. Maeng, W. Maeng, W.-J. Maeng, W.J. Maeng, Wan-Joo Maeng, Wanjoo Maeng

59

Publications

3.2K

Citations

24

H-Index

49

Concepts

All Affiliations

Pohang University of Science and Technology Samsung (South Korea)Yonsei University University of Wisconsin–Madison Hanyang University

WJ

About

W. J. Maeng is an author at Pohang University of Science and Technology specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	24	40	3K
2	Applied Physics	23	38	2.9K
3	Electrical Engineering	19	26	2K
4	Chemical Engineering	4	4	108
5	Chemistry	3	3	157

W. J. Maeng

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47

Publications

3.2K

Citations

24

H-Index

	Year	Citations
Review of recent developments in amorphous oxide semiconductor thin-film transistor devices Joon Seok Park, W. J. Maeng, Hyun‐Suk Kim, Thin Solid Films Materials ScienceElectrical EngineeringEngineeringOxide ElectronicsApplied Physics	2011	1K
Applications of atomic layer deposition to nanofabrication and emerging nanodevices Hyungjun Kim, Han‐Bo‐Ram Lee, W. J. Maeng Thin Solid Films Materials ScienceEngineeringNanomaterialsNanotechnologyNanodevices	2008	584
Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode Sang-Joon Park, Woo‐Hee Kim, Han‐Bo‐Ram Lee, Microelectronic Engineering Materials ScienceElectrical EngineeringEngineeringMetal ElectrodeSurface Electrochemistry	2007	103
Thermal and Plasma-Enhanced ALD of Ta and Ti Oxide Thin Films from Alkylamide Precursors W. J. Maeng, H. Kim Electrochemical and Solid-State Letters	2006	91
The influence of SiOx and SiNx passivation on the negative bias stability of Hf–In–Zn–O thin film transistors under illumination Joon Seok Park, Tae Sang Kim, Kyoung Seok Son, Applied Physics Letters Negative Bias StabilityEngineeringWhite LightOptoelectronic DevicesSemiconductor Device	2010	90
Studies on optical, structural and electrical properties of atomic layer deposited Al-doped ZnO thin films with various Al concentrations and deposition temperatures W. J. Maeng, Jaewon Lee, Ju Ho Lee, Journal of Physics D Applied Physics Aluminium NitrideOptical MaterialsEngineeringThin Film Process TechnologyAtomic Layer	2011	75
Atomic layer deposited p-type copper oxide thin films and the associated thin film transistor properties W. J. Maeng, Seung-Hwan Lee, Jung-Dae Kwon, Ceramics International Materials ScienceElectrical EngineeringEngineeringOxide ElectronicsApplied Physics	2015	73
Growth characteristics and electrical properties of La2O3 gate oxides grown by thermal and plasma-enhanced atomic layer deposition Woo‐Hee Kim, W. J. Maeng, Kyeong-Ju Moon, Thin Solid Films Materials ScienceGrowth CharacteristicsElectrical EngineeringEngineeringLa2o3 Gate Oxides	2010	68
Indium oxide thin film prepared by low temperature atomic layer deposition using liquid precursors and ozone oxidant W. J. Maeng, Dongwon Choi, Jozeph Park, Journal of Alloys and Compounds Materials ScienceEngineeringOxide ElectronicsOzone OxidantSurface Science	2015	63
The conducting tin oxide thin films deposited via atomic layer deposition using Tetrakis-dimethylamino tin and peroxide for transparent flexible electronics Dongwon Choi, W. J. Maeng, Jin‐Seong Park Applied Surface Science Materials ScienceEngineeringFlexible ElectronicsOxide ElectronicsApplied Physics	2014	60

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