Concepedia
Statistics
Publications
21
Citations
613
H-Index
16
Active since
1991
Affiliations
Danbury Hospital(Current)
Stanford University
Siemens (Germany)
North Carolina State University
Texas Instruments (United States)
Jeffrey F. Roeder is an author at Danbury Hospital specializing in materials engineering, natural sciences, and materials science.
Publications per year
1991–2018
Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors
B. C. Hendrix, A. S. Borovik, Chen Xu et al. · Applied Physics Letters · 2002 · 65 citations
Natural Sciences, Materials Engineering, Materials Science +17
Metalorganic Chemical Vapor Deposition of Complex Metal Oxide Thin Films by Liquid Source Chemical Vapor Deposition
Peter C. Van Buskirk, Steve Bilodeau, Jeffrey F. Roeder et al. · Japanese Journal of Applied Physics · 1996 · 63 citations
Natural Sciences, Materials Engineering, Materials Science +16
Effect of applied mechanical strain on the ferroelectric and dielectric properties of Pb(Zr0.35Ti0.65)O3 thin films
Maxim B. Kelman, Paul C. McIntyre, B. C. Hendrix et al. · Journal of Applied Physics · 2003 · 54 citations
New Tantalum Amido Complexes with Chelate Ligands as Metalorganic (MO) Precursors for Chemical Vapor Deposition (CVD) of Tantalum Nitride Thin Films
Tianniu Chen, Chongying Xu, Thomas H. Baum et al. · Chemistry of Materials · 2009 · 46 citations
Natural Sciences, Chemistry, Materials Science +17
Thickness-dependent phase evolution of polycrystalline Pb(Zr0.35Ti0.65)O3 thin films
Maxim B. Kelman, Lawrence F. Schloss, Paul C. McIntyre et al. · Applied Physics Letters · 2002 · 41 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +14
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