Jeffrey F. Roeder

Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors

B. C. Hendrix, A. S. Borovik, Chen Xu et al. · Applied Physics Letters · 2002 · 65 citations

Engineering, Hafnium Silicate, Hf1−xsixo2 Films +16

Metalorganic Chemical Vapor Deposition of Complex Metal Oxide Thin Films by Liquid Source Chemical Vapor Deposition

Peter C. Van Buskirk, Steve Bilodeau, Jeffrey F. Roeder et al. · Japanese Journal of Applied Physics · 1996 · 63 citations

Materials Science, Materials Engineering, Electrical Engineering +12

Effect of applied mechanical strain on the ferroelectric and dielectric properties of Pb(Zr0.35Ti0.65)O3 thin films

Maxim B. Kelman, Paul C. McIntyre, B. C. Hendrix et al. · Journal of Applied Physics · 2003 · 54 citations

Engineering, Mechanical Engineering, Thin Film Process Technology +19

New Tantalum Amido Complexes with Chelate Ligands as Metalorganic (MO) Precursors for Chemical Vapor Deposition (CVD) of Tantalum Nitride Thin Films

Tianniu Chen, Chongying Xu, Thomas H. Baum et al. · Chemistry of Materials · 2009 · 46 citations

Materials Science, Inorganic Chemistry, Engineering +10

Thickness-dependent phase evolution of polycrystalline Pb(Zr0.35Ti0.65)O3 thin films

Maxim B. Kelman, Lawrence F. Schloss, Paul C. McIntyre et al. · Applied Physics Letters · 2002 · 41 citations · Full text

Materials Science, Materials Engineering, Material Analysis +13