Jeffrey F. Roeder - Concepedia

Author

Jeffrey F. Roeder

Also Known As

J. F Roeder, J. F. Roeder, J. Roeder, J.F Roeder, J.F. Roeder, Jeffrey F Roeder, Jeffrey F. Roeder, Jeffrey F. Roeder Jeffrey F. Roeder, Jeffrey Roeder, Jonas Roeder

Publications

691

Citations

H-Index

Concepts

All Affiliations

Danbury Hospital Stanford University Siemens (Germany)North Carolina State University Texas Instruments (United States)

About

Jeffrey F. Roeder is an author at Danbury Hospital specializing in engineering, materials science, and thin films.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	16	21	611
2	Applied Physics	13	16	434
3	Chemistry	7	7	261
4	Chemical Engineering	2	2	58
5	Natural Sciences	1	1	13

Jeffrey F. Roeder

Publications

611

Citations

H-Index

Page 1

	Year	Citations
Composition control of Hf1−xSixO2 films deposited on Si by chemical-vapor deposition using amide precursors B. C. Hendrix, A. S. Borovik, Chen Xu, Applied Physics Letters EngineeringHafnium SilicateHf1−xsixo2 FilmsThin Film Process TechnologyChemistry	2002	65
Metalorganic Chemical Vapor Deposition of Complex Metal Oxide Thin Films by Liquid Source Chemical Vapor Deposition Peter C. Van Buskirk, Steve Bilodeau, Jeffrey F. Roeder, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringElectrical EngineeringEngineeringOxide Electronics	1996	63
Effect of applied mechanical strain on the ferroelectric and dielectric properties of Pb(Zr0.35Ti0.65)O3 thin films Maxim B. Kelman, Paul C. McIntyre, B. C. Hendrix, Journal of Applied Physics EngineeringMechanical EngineeringThin Film Process TechnologyMultiferroicsElectronic Devices	2003	54
New Tantalum Amido Complexes with Chelate Ligands as Metalorganic (MO) Precursors for Chemical Vapor Deposition (CVD) of Tantalum Nitride Thin Films Tianniu Chen, Chongying Xu, Thomas H. Baum, Chemistry of Materials Materials ScienceInorganic ChemistryEngineeringAlternative Mocvd PrecursorCoordination Complex	2009	46
Thickness-dependent phase evolution of polycrystalline Pb(Zr0.35Ti0.65)O3 thin films Maxim B. Kelman, Lawrence F. Schloss, Paul C. McIntyre, Applied Physics Letters Materials ScienceMaterials EngineeringMaterial AnalysisRhombohedral Crystal StructureEngineering	2002	41
Manufacturing of perovskite thin films using liquid delivery MOCVD Peter C. Van Buskirk, Jeffrey F. Roeder, S. Bilodeau Integrated ferroelectrics Materials ScienceMaterials EngineeringPzt Thin FilmsEngineeringPerovskite Solar Cell	1995	41
Ferroelectric strontium bismuth tantalate thin films deposited by metalorganic chemical vapour deposition (MOCVD) Jeffrey F. Roeder, B. C. Hendrix, Frank Hintermaier, Journal of the European Ceramic Society Materials ScienceEngineeringFerroelectric ApplicationOxide ElectronicsApplied Physics	1999	38
Liquid-delivery MOCVD: chemical and process perspectives on ferro-electric thin film growth Jeffrey F. Roeder, T. H. Baum, S. Bilodeau, Advanced Materials for Optics and Electronics EngineeringSolid-state ChemistryChemistryLiquid-delivery MocvdChemical Deposition	2000	38
Electrochemical Fabrication of Mechanically Robust PbSn C4 Interconnections Madhav Datta, R. V. Shenoy, C. Jahnes, Journal of The Electrochemical Society EngineeringMechanical EngineeringElectrometallurgyMaterials FabricationCollapse Chip Connection	1995	37
Origin and implications of the observed rhombohedral phase in nominally tetragonal Pb(Zr0.35Ti0.65)O3 thin films Maxim B. Kelman, Paul C. McIntyre, Alexei Gruverman, Journal of Applied Physics EngineeringCrystal Growth TechnologyThin Films StressesObserved Rhombohedral PhaseFerroelectric Application	2003	20

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