Kazuhiko Kashima - Concepedia

Author

Kazuhiko Kashima

Toshiba (Japan)

Also Known As

KAZUHIKO KASHIMA, Kazuhiko Kashima

Publications

201

Citations

H-Index

Concepts

All Affiliations

Toshiba (Japan)Nagoya University

About

Kazuhiko Kashima is an author at Toshiba (Japan) specializing in engineering, applied physics, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	121
2	Applied Physics	7	7	121
3	Chemical Engineering	2	2	28
4	Natural Sciences	1	1	14
5	Chemistry	1	1	14

Kazuhiko Kashima

Publications

121

Citations

H-Index

Page 1

	Year	Citations
In-situ observation of bubble formation at silicon melt–silica glass interface Toshiro Minami, Susumu Maeda, Mitsuo Higasa, Journal of Crystal Growth Materials ScienceGlass-ceramicBubble DynamicEngineeringSurface Science	2010	39
Quantitative analysis of carbon impurity concentration in silicon epitaxial layers by luminescence activation using carbon ion implantation and electron irradiation S. Nakagawa, Kazuhiko Kashima Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics SemiconductorsCarbon Impurity ConcentrationElectrical EngineeringElectronic DevicesLuminescence Activation	2014	17
Oxygen precipitation in Czochralski-grown silicon wafers during hydrogen annealing Koji Izunome, Hiroshi Shirai, Kazuhiko Kashima, Applied Physics Letters Materials ScienceChemical EngineeringEngineeringHydrogen AnnealingCrystalline Defects	1996	17
Effect of Sn atoms on incorporation of vacancies in epitaxial Ge<sub>1−</sub><i><sub>x</sub></i>Sn<i><sub>x</sub></i>film grown at low temperature Eiji Kamiyama, S. Nakagawa, Koji Sueoka, Applied Physics Express EngineeringPositron Annihilation SpectroscopyGe1−xsnx Thin FilmAtomic Emission SpectroscopyChemistry	2014	14
Elastic Softening of Surface Acoustic Wave Caused by Vacancy Orbital in Silicon Wafer Keisuke Mitsumoto, Mitsuhiro Akatsu, S. Baba, Journal of the Physical Society of Japan EngineeringAcoustic MetamaterialSilicon On InsulatorElastic SofteningWafer Scale Processing	2014	12
Analysis for positions of Sn atoms in epitaxial Ge1−xSnx film in low temperature depositions Eiji Kamiyama, Koji Sueoka, Osamu Nakatsuka, Thin Solid Films Materials EngineeringMaterials ScienceEngineeringSurface ScienceApplied Physics	2013	11
Intrinsic Gettering in Nitrogen-Doped and Hydrogen-Annealed Czochralski-Grown Silicon Wafers Hiroyuki Goto, Lian-Sheng Pan, Masafumi Tanaka, Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringChemical EngineeringEngineeringSilicon Capacitor	2001	11

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