Osamu Nakatsuka

High resolution-high energy x-ray photoelectron spectroscopy using third-generation synchrotron radiation source, and its application to Si-high k insulator systems

Keisuke Kobayashi, Makina Yabashi, Y. Takata et al. · Applied Physics Letters · 2003 · 353 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Growth of highly strain-relaxed Ge1−xSnx/virtual Ge by a Sn precipitation controlled compositionally step-graded method

Shotaro Takeuchi, Yosuke Shimura, Osamu Nakatsuka et al. · Applied Physics Letters · 2008 · 123 citations

Natural Sciences, Materials Engineering, Materials Science +17

Characterization of GeSn materials for future Ge pMOSFETs source/drain stressors

Benjamin Vincent, Yosuke Shimura, Shotaro Takeuchi et al. · Microelectronic Engineering · 2010 · 105 citations

Engineering, Electrical Engineering, Materials Science +14

Mobility Behavior of Ge_1-xSn_xLayers Grown on Silicon-on-Insulator Substrates

Osamu Nakatsuka, Norimasa Tsutsui, Yosuke Shimura et al. · Japanese Journal of Applied Physics · 2010 · 100 citations

Engineering, Materials Engineering, Materials Science +17

Development of Ni/Al and Ni/Ti/Al ohmic contact materials for p-type 4H-SiC

Ryohei Konishi, Ryuichi Yasukochi, Osamu Nakatsuka et al. · Materials Science and Engineering B · 2003 · 98 citations

Engineering, Materials Engineering, Materials Science +12