Statistics
Publications
24
Citations
600
H-Index
14
Active since
1980
Y. Mishima is an author at Fujitsu (Japan) specializing in materials science, engineering, and electrical engineering.
Publications per year
1980–2022
24
24
Characterization of plasma-deposited microcrystalline silicon
Y. Mishima, Seiichi Miyazaki, M. Hirose et al. · Philosophical Magazine B · 1982 · 99 citations
Direct photochemical deposition of SiO2 from the Si2H6+O2 system
Y. Mishima, M. Hirose, Y. Osaka et al. · Journal of Applied Physics · 1984 · 54 citations
Natural Sciences, Materials Engineering, Materials Science +14
Polycrystalline silicon formed by ultrahigh-vacuum sputtering system
Y. Mishima, M. Takei, T. Uematsu et al. · Journal of Applied Physics · 1995 · 41 citations
Natural Sciences, Materials Engineering, Materials Science +17
1–5 of 24