Tai-Wei Lin

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Active since

2016

Affiliations

Tai-Wei Lin is an author at Tokyo Institute of Technology specializing in gate dielectric engineering, semiconductor physics, and wide bandgap semiconductor applications.

Publications per year

2016–2016

Publications

Improved linearity and reliability in GaN metal–oxide–semiconductor high-electron-mobility transistors using nanolaminate La2O3/SiO2 gate dielectric

Ching‐Hsiang Hsu, Wang-Cheng Shih, Yueh-Chin Lin et al. · Japanese Journal of Applied Physics · 2016 · 15 citations

Engineering, Electrical Engineering, Materials Science +16

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