Hyung‐Suk Jung

Reduction of Electrical Defects in Atomic Layer Deposited HfO₂ Films by Al Doping

Tae Joo Park, Jeong Hwan Kim, Jae Hyuck Jang et al. · Chemistry of Materials · 2010 · 81 citations

Natural Sciences, Materials Engineering, Materials Science +17

Toward Advanced High‐<i>k</i> and Electrode Thin Films for DRAM Capacitors via Atomic Layer Deposition

Se Eun Kim, Ju Young Sung, Jae Deock Jeon et al. · Advanced Materials Technologies · 2022 · 57 citations

Natural Sciences, Materials Engineering, Materials Science +17

Electrical characteristics of an ultrathin (1.6 nm) TaOxNy gate dielectric

Hyung‐Suk Jung, Kiju Im, Hyunsang Hwang et al. · Applied Physics Letters · 2000 · 40 citations

Natural Sciences, Materials Engineering, Materials Science +17

Impacts of Zr Composition in $\hbox{Hf}_{1-x} \hbox{Zr}_{x}\hbox{O}_{y}$ Gate Dielectrics on Their Crystallization Behavior and Bias-Temperature-Instability Characteristics

Hyung‐Suk Jung, So-Ah Lee, Sang-Ho Rha et al. · IEEE Transactions on Electron Devices · 2011 · 40 citations

Natural Sciences, Materials Engineering, Materials Science +17

Investigation of oxygen-related defects and the electrical properties of atomic layer deposited HfO2 films using electron energy-loss spectroscopy

Jae Hyuck Jang, Hyung‐Suk Jung, Jeong Hwan Kim et al. · Journal of Applied Physics · 2011 · 39 citations

Natural Sciences, Materials Engineering, Materials Science +17