J. Y. Cheng - Concepedia

Concepedia

Author

J. Y. Cheng

Massachusetts Institute of Technology

Also Known As

J. Cheng, J. Y. Cheng, J.Y. Cheng, J. Y. Cheng, Jinghua Cheng, Jin‐Shun Cheng

16

Publications

1.9K

Citations

9

H-Index

46

Concepts

All Affiliations

Massachusetts Institute of Technology University of Twente IBM Research - Almaden IBM (United States)

JY

About

J. Y. Cheng is an author at Massachusetts Institute of Technology specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	1.9K
2	Applied Physics	7	7	1.8K
3	Natural Sciences	1	1	402
4	Biomolecular Engineering	1	1	36
5	Chemistry	1	1	36

J. Y. Cheng

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9

Publications

1.9K

Citations

9

H-Index

	Year	Citations
Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography J. Y. Cheng, C. A. Ross, Vanessa Z.-H. Chan, Advanced Materials Magnetic PropertiesCo DotsEngineeringPolymer-based MagnetMagnetism	2001	667
Fabrication of nanostructures with long-range order using block copolymer lithography J. Y. Cheng, C. A. Ross, Edwin L. Thomas, Applied Physics Letters EngineeringPattern TransferNanostructured PolymerBlock CopolymerBlock Copolymer Lithography	2002	412
Polymer self assembly in semiconductor microelectronics Charles T. Black, Ricardo Ruiz, Greg Breyta, IBM Journal of Research and Development EngineeringMolecular Self-assemblyIntegrated CircuitsPolymersSemiconductors	2007	402
Magnetic behavior of lithographically patterned particle arrays (invited) C. A. Ross, S. Haratani, Fernando Castaño, Journal of Applied Physics EngineeringMagnetic ResonanceMagnetismMagnetic BehaviorNanoengineering	2002	126
Patterned Magnetic Media Made by Self-Assembled Block-Copolymer Lithography C. A. Ross, J. Y. Cheng MRS Bulletin Materials ScienceMagnetismEngineeringMicrofabricationSelf-assembly	2008	74
Pattern Registration Between Spherical Block‐Copolymer Domains and Topographical Templates J. Y. Cheng, F. Zhang, Henry I. Smith, Advanced Materials Materials SciencePattern FormationBlock Co-polymersEngineeringBlock Copolymer	2006	66
High performance 65 nm SOI technology with dual stress liner and low capacitance SRAM cell E. Leobandung, H. Nayakama, D. Mocuta, Electrical EngineeringEngineeringVlsi DesignAdvanced Packaging (Semiconductors)Nm Soi Technology	2005	65
Polymerization and copolymerization of α‐alkylacrylic acids and characterization of their polymers J. Y. Cheng, Bunichiro Yamada, Takayuki Otsu Journal of Polymer Science Part A Polymer Chemistry α‐Alkylacrylic AcidsMacromolecular ChemistryEngineeringOrganic ChemistryChemistry	1991	36
Multilayer magnetic antidot arrays from block copolymer templates Vivian P. Chuang, Won Jung, C. A. Ross, Journal of Applied Physics Magnetic PropertiesEngineeringPolymer-based MagnetMagnetic ResonanceContinuous Films	2008	28

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