Magnetic behavior of lithographically patterned particle arrays (invited)

Abstract

This article reviews recent progress in the fabrication, characterization, and analysis of large area arrays of sub-100-nm magnetic particles made by lithographic techniques. Particles are made by electrodeposition, evaporation and liftoff, or sputtering and etching, leading to a wide range of shapes, compositions, and microstructures. The remanent states, magnetic hysteresis, and uniformity of the particles and the interparticle interactions will be discussed.