Dong-Soo Yoon - Concepedia

Author

Dong-Soo Yoon

Yonsei University

Also Known As

Dong-Soo Yoon

Publications

191

Citations

H-Index

Concepts

All Affiliations

Yonsei University Kangwon National University Samsung (South Korea)

About

Dong-Soo Yoon is an author at Yonsei University specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	161
2	Applied Physics	8	8	161
3	Chemistry	2	2	32
4	Electrical Engineering	2	2	36
5	Chemical Engineering	1	1	22

Dong-Soo Yoon

Publications

171

Citations

H-Index

Page 1

	Year	Citations
Effect on thermal stability of a Cu/Ta/Si heterostructure of the incorporation of cerium oxide into the Ta barrier Dong-Soo Yoon, Hong Koo Baik, Sung-Man Lee Journal of Applied Physics Materials ScienceEpitaxial GrowthEngineeringOxide ElectronicsSurface Science	1998	36
Tantalum-microcrystalline CeO2 diffusion barrier for copper metallization Dong-Soo Yoon, Hong Koo Baik, Sung-Man Lee Journal of Applied Physics EngineeringTransition Metal BarriersCerium DioxideMaterials EngineeringMaterials Science	1998	28
Oxidation resistance of tantalum–ruthenium dioxide diffusion barrier for memory capacitor bottom electrodes Dong-Soo Yoon, Hong Koo Baik, Sung-Man Lee, Applied Physics Letters EngineeringElectrode-electrolyte InterfaceOxidation ResistanceSolid-state ChemistryChemistry	1998	22
Effect of interposed Cr layer on the thermal stability of Cu/Ta/Si structure Dong-Soo Yoon, Hong Koo Baik, Byoung-Sun Kang, Journal of Applied Physics Materials EngineeringMaterials ScienceTa LayerEngineeringFree Si	1996	20
Investigation of Pt/Ta diffusion barrier using hybrid conductive oxide (RuO2) for high dielectric applications Dong-Soo Yoon, Hong Koo Baik, Sung-Man Lee, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceMaterials EngineeringPt/ta Diffusion BarrierHigh Dielectric ApplicationsRuthenium Dioxide	1998	16
Tantalum–ruthenium dioxide as a diffusion barrier between Pt bottom electrode and TiSi2 ohmic contact layer for high density capacitors Dong-Soo Yoon, Hong Koo Baik, Sung-Man Lee, Journal of Applied Physics EngineeringElectrode-electrolyte InterfacePt Bottom ElectrodeHigh Density CapacitorsRuo2 Addition	1999	15
Microcrystalline oxide-incorporated new diffusion barrier for dynamic random access memory and ferroelectric random access memory capacitor electrode Dong-Soo Yoon, Hong Koo Baik, Sung-Man Lee Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Non-volatile MemoryEngineeringEmerging Memory TechnologyFerroelectric Random-access MemoryMicrocrystalline Oxide	1997	14
Investigation of the mechanism of titanium silicide reaction using ion-beam-assisted deposition Jaeho Chang, Gi Bum Kim, Dong-Soo Yoon, Applied Physics Letters EngineeringChemistryTi DiffusionChemical DepositionSilicon On Insulator	1999	10
Investigation of Ta–RuO2 diffusion barrier for high density memory capacitor applications Dong-Soo Yoon, Hong Koo Baik, Sung-Man Lee, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena	1998	10

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