Klaus Heidemann - Concepedia

Author

Klaus Heidemann

Also Known As

K. F. Heidemann, K. Heidemann, K.F Heidemann, K.F. Heidemann, Klaus F. Heidemann, Klaus Frieder Heidemann, Klaus Heidemann

148

Publications

724

Citations

H-Index

Concepts

All Affiliations

TU Dortmund University Carl Zeiss (Germany)United States Naval Research Laboratory Lawrence Livermore National Laboratory Bielefeld University

About

Klaus Heidemann is an author at TU Dortmund University specializing in engineering, applied physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	15	372
2	Applied Physics	13	16	478
3	Health Sciences	3	3	131
4	Natural Sciences	1	1	16
5	Biomedical Engineering	1	1	21

Klaus Heidemann

Publications

616

Citations

H-Index

Page 1

	Year	Citations
Model of temperature dependent defect interaction and amorphization in crystalline silicon during ion irradiation N. Hecking, Klaus Heidemann, E. te Kaat Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Ion ImplantationCrystalline SiliconPhysicsApplied PhysicsDefect Formation	1986	159
Optics and mechanisms for the Extreme-Ultraviolet Imaging Spectrometer on the Solar-B satellite C. M. Korendyke, C. M. Brown, Roger J. Thomas, Applied Optics Ultraviolet LightShort Wavelength OpticVisible LightEngineeringOptical Metrology	2006	77
Complex-refractive-index profiles of 4 MeV Ge ion-irradiation damage in silicon Klaus Heidemann Philosophical Magazine B Wedge Interference FringesIon ImplantationOptical MaterialsEngineeringCrystalline Defects	1981	53
From Soft to Hard X-ray with a Single Grating Monochromator Daniele Cocco, A. Bianco, Burkhard Kaulich, AIP conference proceedings Optical MaterialsX-ray SpectroscopyEngineeringMicroscopyPolycapillary Optics	2007	33
The optical properties of SiO<sub>x</sub>formed by high-dose Si ion implantation into fused silica Klaus Heidemann Radiation Effects Short Wavelength OpticOptical MaterialsEngineeringLaser ApplicationsOptoelectronic Devices	1982	25
Range and range straggling of oxygen implanted into silicon at energies between 2 and 20 MeV H. Kappert, Klaus Heidemann, Daniela Eichholz, Applied Physics A Ion ImplantationPhysicsApplied PhysicsSemiconductor Device FabricationVacuum Device	1980	24
Record high extreme-ultraviolet efficiency at near-normal incidence from a multilayer-coated polymer-overcoated blazed ion-etched holographic grating Michael Kowalski, R. G. Cruddace, Klaus Heidemann, Optics Letters	2004	22
Efficiency of a multilayer-coated, ion-etched laminar holographic grating in the 145–160-nm wavelength region M. P. Kowalski, R. G. Cruddace, J. F. Seely, Optics Letters Transient GratingOptical MaterialsEngineeringElectron-beam LithographyHolographic Method	1997	21
Range and damage profiling after heavy ion implantation in the MeV region H. Kappert, Klaus Heidemann, Barbro Grabe, physica status solidi (a) EngineeringRadiation EffectRadiation ExposureBiomedical EngineeringSilicon On Insulator	1978	21
Optical characterization of damage and concentration profiles in H ion implanted amorphous silicon Klaus Heidemann, Matilda Grüner, E. te Kaat Radiation Effects H IonOptical MaterialsEngineeringOptoelectronic DevicesIntegrated Circuits	1984	21

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