Han Ku Cho

Trade-off between inverse lithography mask complexity and lithographic performance

Byung‐Gook Kim, Sung Soo Suh, Byung Sung Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 58 citations

Engineering, Electrical Engineering, Manufacturing Engineering +11

Chamber maintenance and fault detection technique for a gate etch process via self-excited electron resonance spectroscopy

Kye Hyun Baek, Youngjae Jung, Gyung Jin Min et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2005 · 25 citations

Engineering, Electrical Engineering, Physics +17

An effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing

Kye Hyun Baek, Thomas F. Edgar, Ki-Wook Song et al. · Computers & Chemical Engineering · 2013 · 22 citations

Engineering, Electrical Engineering, Manufacturing Engineering +16

Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials

Sungmin Huh, Gisung Yoon, Jaehyuck Choi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 10 citations

Engineering, Materials Engineering, Materials Science +15