J. Rieger

Comparison of the damage and contamination produced by CF4 and CF4/H2 reactive ion etching: The role of hydrogen

X. C. Mu, S.J. Fonash, A. Rohatgi et al. · Applied Physics Letters · 1986 · 38 citations

Materials Science, Environmental Chemistry, Chemical Engineering +14

Tunable twin-guide (TTG) distributed feedback (DFB) laser with over 10 nm continuous tuning range

T. Wolf, S. Illek, J. Rieger et al. · Electronics Letters · 1993 · 30 citations

Photonics, Engineering, Optical Transmission System +12

Gain-coupled DFB lasers with atitanium surface Bragg grating

T.W. Johannes, A. Rast, W. Harth et al. · Electronics Letters · 1995 · 25 citations

Ar ion beam and CCl4 reactive ion etching: A comparison of etching damage and of damage passivation by hydrogen

X. C. Mu, Stephen J. Fonash, Bing-Chwen Yang et al. · Journal of Applied Physics · 1985 · 23 citations

Engineering, Single-crystal Silicon, Silicon On Insulator +17

Comparison of Zn and Mg incorporation in MOVPE InP/GaInAsP laser structures

E. Veuhoff, H. Baumeister, J. Rieger et al. · Journal of Electronic Materials · 1991 · 20 citations

Materials Science, Materials Engineering, Advanced Laser Processing +9