Gi Chung Kwon - Concepedia

Author

Gi Chung Kwon

Kwangwoon University

Also Known As

G. C. Kwon, G.C. Kwon, Gi C. Kwon, Gi Chung Kwon, Guhyeon Kwon

Publications

315

Citations

H-Index

Concepts

All Affiliations

Kwangwoon University Sungkyunkwan University Jusung Engineering (South Korea)

About

Gi Chung Kwon is an author at Kwangwoon University specializing in engineering, physics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	6	6	203
2	Applied Physics	4	4	71
3	Natural Sciences	3	3	124
4	Biomedical Engineering	1	1	41
5	Chemical Engineering	1	1	91

Gi Chung Kwon

Publications

287

Citations

H-Index

Page 1

	Year	Citations
Measurement of Reactive Hydroxyl Radical Species Inside the Biosolutions During Non-thermal Atmospheric Pressure Plasma Jet Bombardment onto the Solution Yong‐Hee Kim, Young Joon Hong, Ku Youn Baik, Plasma Chemistry and Plasma Processing Cold Atmospheric PlasmaChemical EngineeringIon CollectorEngineeringRadical Emission	2014	91
Analysis of the antimicrobial effects of nonthermal plasma on fungal spores in ionic solutions Min Ho Kang, Young Joon Hong, Pankaj Attri, Free Radical Biology and Medicine Cold Atmospheric PlasmaAntifungal AgentIonic SolutionsFungal SporesMicrobiology	2014	44
Plasma Apparatuses for Biomedical Applications Yun‐Jung Kim, Sewhan Jin, Gook-Hee Han, IEEE Transactions on Plasma Science Dbd PlasmasElectrical EngineeringEngineeringPlasma ApparatusesAerospace Engineering	2015	41
Cold Plasma Jets Made of a Syringe Needle Covered With a Glass Tube Guangsup Cho, Hyungyo Lim, Jung-Hyun Kim, IEEE Transactions on Plasma Science Cold Atmospheric PlasmaExternal Ground ElectrodeElectrical EngineeringSyringe Needle CoveredSyringe Needle	2011	40
Effect of high-frequency variation on the etch characteristics of ArF photoresist and silicon nitride layers in dual frequency superimposed capacitively coupled plasma D. H. Kim, C. H. Lee, S. H. Cho, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringArf PhotoresistPlasma ProcessingHigh-frequency VariationOptical Properties	2005	24
Measurement of Electron Temperature and Density Using Stark Broadening of the Coaxial Focused Plasma for Extreme Ultraviolet Lithography Young Joon Hong, Gi Chung Kwon, Guangsup Cho, IEEE Transactions on Plasma Science EngineeringPlasma PhysicsExtreme UltravioletOptical DiagnosticsOptical Properties	2010	21
Effect of different frequency combination on ArF photoresist deformation and silicon dioxide etching in the dual frequency superimposed capacitively coupled plasmas C. H. Lee, D. H. Kim, N.-E. Lee, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceArf Photoresist DeformationEngineeringPhysicsOptical Properties	2006	14
Heterodyne wave number measurement using a double B-dot probe G. S. Eom, Gi Chung Kwon, Inshik Bae, Review of Scientific Instruments Number MeasurementEngineeringPlasma SciencePlasma WavePlasma Physics	2001	12

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