F.‐G. Kirscht

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Publications

Citations

546

H-Index

Active since

1981

Affiliations

CiS Forschungsinstitut für Mikrosensorik GmbH(Current)

Mitsubishi Corporation (United States)

Technische Universität Ilmenau

University of California, Berkeley

F.‐G. Kirscht is an author at CiS Forschungsinstitut für Mikrosensorik GmbH specializing in materials science, electronic materials, and semiconductor materials.

Publications per year

1981–2013

Publications

Raman microspectroscopy study of processing-induced phase transformations and residual stress in silicon

Yury Gogotsi, Chang‐Wook Baek, F.‐G. Kirscht · Semiconductor Science and Technology · 1999 · 235 citations

Natural Sciences, Materials Engineering, Materials Science +16

Infrared Spectroscopical and TEM Investigations of Oxygen Precipitation in Silicon Crystals with Medium and High Oxygen Concentrations

P. Gawobzewski, Erzsébet Hild, F.‐G. Kirscht et al. · physica status solidi (a) · 1984 · 58 citations

Natural Sciences, Materials Engineering, Materials Science +17

Recent advanced applications of AAS and ICP-MS in the semiconductor industry

Mohammad Bagher Shabani, Yusuke Shiina, F.‐G. Kirscht et al. · Materials Science and Engineering B · 2003 · 35 citations

Engineering, Materials Engineering, Materials Science +10

DLTS study on deep level defects in Cz-p-Si due to heat treatment at 600 to 900 °C

K. Schmalz, F.‐G. Kirscht, H. Klose et al. · physica status solidi (a) · 1987 · 32 citations

Natural Sciences, Materials Engineering, Materials Science +17

A study of gettering efficiency and stability in Czochralski silicon

Scott A. McHugo, E. R. Weber, Masaya Mizuno et al. · Applied Physics Letters · 1995 · 28 citations

Engineering, Materials Engineering, Materials Science +13

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