S. Yamanaka - Concepedia

Author

S. Yamanaka

Also Known As

K Hosono, S Yamanaka, S. YAMANAKA, S. Yamanaka, Shun'Ichi Yamanaka, Shun'ichi Yamanaka, Shun-ichi Yamanaka, Shunichi YAMANAKA, Shunichi Yamanaka, Shun‐Ichi Yamanaka

Publications

Citations

H-Index

Concepts

All Affiliations

Tokyo Institute of Technology Tokyo Polytechnic University

About

S. Yamanaka is an author at Tokyo Institute of Technology specializing in engineering, thin films, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	17	22	865
2	Applied Physics	16	21	845
3	Natural Sciences	12	13	525
4	Electrical Engineering	4	4	150
5	Chemistry	1	1	17

S. Yamanaka

Publications

898

Citations

H-Index

Page 1

	Year	Citations
Facing targets type of sputtering method for deposition of magnetic metal films at low temperature and high rate M. Naoe, S. Yamanaka, Y. Hoshi IEEE Transactions on Magnetics Magnetic PropertiesEngineeringNew TypeMo Permalloy FilmsChemical Deposition	1980	188
Synthesis of iron-nitride films by means of ion beam deposition Norio Terada, Y. Hoshi, M. Naoe, IEEE Transactions on Magnetics Materials ScienceMagnetismFerromagnetismMagnetic PropertiesIon Beam Deposition	1984	134
Formation of Ba-ferrite films with perpendicular magnetization by targets-facing type of sputtering M. Matsuoka, Y. Hoshi, M. Naoe, IEEE Transactions on Magnetics Targets-facing TypeMagnetic PropertiesCrystal StructureEngineeringPerpendicular Magnetization	1982	84
Preparation of barium ferrite films with perpendicular magnetic anisotropy by DC sputtering M. Naoe, Seiki Hasunuma, Y. Hoshi, IEEE Transactions on Magnetics Magnetic PropertiesPerpendicular Magnetic AnisotropyEngineeringSaturation Magnetization MsMagnetic Materials	1981	76
High Rate Deposition of Iron Films by Sputtering from Two Facing Targets Youichi Hoshi, M. Naoe, S. Yamanaka Japanese Journal of Applied Physics Materials ScienceMaterials EngineeringHigh Rate DepositionEngineeringPhysics	1977	37
Preparation of Ba-ferrite films for perpendicular magnetic recording by RF targets facing type of sputtering M. Matsuoka, Y. Hoshi, M. Naoe, IEEE Transactions on Magnetics Magnetic PropertiesEngineeringMagnetic MaterialsBam FilmsElectromagnetic Compatibility	1984	37
Properties of (Fe,Co)-(Ta,W) amorphous alloy films deposited by rf sputtering M. Naoe, M. Kodaira, Y. Hoshi, IEEE Transactions on Magnetics High Thermal StabilityMagnetic PropertiesCrystal StructureEngineeringThin Film Process Technology	1981	36
Properties of amorphous Co–Ta and Co–W films deposited by rf sputtering M. Naoe, H. Kazama, Y. Hoshi, Journal of Applied Physics Magnetic PropertiesThin Film PhysicsEngineeringRf DiodeThin Film Process Technology	1982	34
Preparation of High-Coercivity Co–Pt Alloy Films by Target-Facing Type of High-Rate Sputtering M. Naoe, Youichi Hoshi, S. Yamanaka, Japanese Journal of Applied Physics Magnetic PropertiesEngineeringThin Film Process TechnologyMagnetic MaterialsMagnetoresistance	1983	26
Nickel Ferrite Thick Films Deposited by Vacuum-Arc Discharge M. Naoe, S. Yamanaka Japanese Journal of Applied Physics Magnetic Propertiesµ ThickEngineeringGlow DischargeVacuum Device	1970	24

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