A. Nagata

Digital chemical vapor deposition and etching technologies for semiconductor processing

Y. Horiike, Tomoko Tanaka, Masatake Nakano et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 68 citations · Full text

Engineering, Digital Etching, Semiconductor Processing +19

Characterization of solid oxide fuel cell device having a three-layer film structure grown by RF magnetron sputtering

A. Nagata, Hideo Okayama · Vacuum · 2002 · 53 citations

Materials Engineering, Magnetism, Electrical Engineering +8

Frequency-hopping wave engineering with metasurfaces

Hiroki Takeshita, Ashif Aminulloh Fathnan, Daisuke Nita et al. · Nature Communications · 2024 · 16 citations · Full text

Digital chemical vapor deposition of SiO2

Masatake Nakano, Hiroyuki Sakaue, Hayami Kawamoto et al. · Applied Physics Letters · 1990 · 13 citations

Materials Engineering, Sio2 Film, Chemical Engineering +11

Plasma-wall interactions in a reversed-field pinch

A. Matsuoka, S. Masamune, A. Nagata et al. · Journal of Nuclear Materials · 1989 · 13 citations

Plasma-wall Interactions, Engineering, Physics +4