Tien Sheng Chao

Suppression of interfacial reaction for HfO2 on silicon by pre-CF4 plasma treatment

Chao‐Sung Lai, Woei Cherng Wu, Tien Sheng Chao et al. · Applied Physics Letters · 2006 · 33 citations

Engineering, Materials Engineering, Materials Science +17

One-Step Cleaning Solution to Replace the Conventional RCA Two-Step Cleaning Recipe for Pregate Oxide Cleaning

Tung Ming Pan, Tan Fu Lei, Tien Sheng Chao et al. · Journal of The Electrochemical Society · 2001 · 33 citations

Engineering, Materials Engineering, Materials Science +17

Characterization of CF4-plasma fluorinated HfO2 gate dielectrics with TaN metal gate

Chao‐Sung Lai, Woei Cherng Wu, Jer‐Chyi Wang et al. · Applied Physics Letters · 2005 · 32 citations

Natural Sciences, Materials Engineering, Materials Science +14

Comparison of ultrathin CoTiO3 and NiTiO3 high-<i>k</i> gate dielectrics

Tung Ming Pan, Tan Fu Lei, Tien Sheng Chao · Journal of Applied Physics · 2001 · 31 citations

Natural Sciences, Electrical Engineering, Materials Science +17

Carrier Transportation Mechanism of the $\hbox{TaN}/ \hbox{HfO}_{2}/\hbox{IL}/\hbox{Si}$ Structure With Silicon Surface Fluorine Implantation

Woei Cherng Wu, Chao‐Sung Lai, Tzu-Ming Wang et al. · IEEE Transactions on Electron Devices · 2008 · 30 citations

Engineering, Electrical Engineering, Materials Science +17