Akihisa Yoshida

Atomic level smoothing of CVD diamond films by gas cluster ion beam etching

Akihisa Yoshida, Masahiro Deguchi, Makoto Kitabatake et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1996 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +15

Phosphorus doping for hydrogenated amorphous silicon films by a low-energy ion doping technique

Akihisa Yoshida, Kentaro Setsune, Takashi Hirao · Applied Physics Letters · 1987 · 28 citations

Natural Sciences, Materials Science, Physics +17

Plasma Ion-Doping Technique with 20 kHz Biased Electron Cyclotron Resonance Discharge

Masatoshi Kitagawa, Naoto Matsuo, Genshyu Fuse et al. · Japanese Journal of Applied Physics · 1988 · 16 citations

Engineering, Materials Science, Physics +17

Large Area Doping Technique Using an Ion Source of rf Discharge with Magnetic Field

Akihisa Yoshida, Masatoshi Kitagawa, Kentaro Setsune et al. · Japanese Journal of Applied Physics · 1988 · 16 citations

Engineering, Electrical Engineering, Materials Science +16

Formation of source and drain regions for a-Si:H thin-film transistors by low-energy ion doping technique

Akihisa Yoshida, Kentaro Setsune, Takashi Hirao · IEEE Electron Device Letters · 1988 · 16 citations

Engineering, Electrical Engineering, Materials Science +17