Shye Lin Wu

Suppression of the boron penetration induced Si/SiO/sub 2/ interface degradation by using a stacked-amorphous-silicon film as the gate structure for pMOSFET

Shye Lin Wu, Chung Len Lee, Tan Fu Lei et al. · IEEE Electron Device Letters · 1994 · 20 citations

Gate Structure, Engineering, Integrated Circuits +16

Electrical characteristics of textured polysilicon oxide prepared by a low-temperature wafer loading and N/sub 2/ preannealing process

Shye Lin Wu, Ta Yow Lin, Chung Len Lee et al. · IEEE Electron Device Letters · 1993 · 19 citations

Doped Polysilicon Film, Engineering, Preannealing Process +17

Electrical characteristics of a stacked nitride/microcrystalline-silicon/oxide/silicon structure

Shye Lin Wu, Chung Len Lee, Tan Fu Lei · Applied Physics Letters · 1993 · 16 citations

Electrical Engineering, Engineering, Physics +8

Polyoxides grown on n/sup +/ polysilicon

Shye Lin Wu, Chun-Yuan Chen, Ta Yow Lin et al. · IEEE Transactions on Electron Devices · 1997 · 16 citations

Materials Science, Materials Engineering, Electrical Engineering +13

Enhancement of oxide break-up by implantation of fluorine in poly-Si emitter contacted p/sup +/-n shallow junction formation

Shye Lin Wu, Chung Len Lee, Tan Fu Lei et al. · IEEE Electron Device Letters · 1994 · 14 citations

Materials Science, Semiconductor Technology, Electrical Engineering +15