T.H. Hsieh

High performance 22/20nm FinFET CMOS devices with advanced high-K/metal gate scheme

Chau-Neng Wu, Dongyang Lin, A. Keshavarzi et al. · 2010 · 105 citations

Finfet Cmos Devices, Electrical Engineering, Engineering +12

Physics and Characterization of Various Hot-Carrier Degradation Modes in LDMOS by Using a Three-Region Charge-Pumping Technique

Chih‐Chia Cheng, Jing-Wei Lin, T. Wang et al. · IEEE Transactions on Device and Materials Reliability · 2006 · 34 citations

Semiconductor Technology, Electrical Engineering, Engineering +9

A high-performance, high-density 28nm eDRAM technology with high-K/metal-gate

Kevin Huang, Chin-Ho Chang, K. C. Tu et al. · 2011 · 22 citations

Edram Technology, Non-volatile Memory, Smallest 0.035 +16

Investigation of Hot Carrier Degradation Modes in LDMOS by using a Novel Three-Region Charge Pumping Technique

Chih‐Chia Cheng, Kaihui Tu, Tahui Wang et al. · 2006 · 21 citations

Electrical Engineering, Engineering, Beak Region +6

Impact of Self-Heating Effect on Hot Carrier Degradation in High-Voltage LDMOS

Chih-Chang Cheng, Jing-Wei Lin, Tahui Wang et al. · 2007 · 18 citations

Electrical Engineering, Engineering, Hot Carrier Degradation +15