R. Lin - Concepedia

Concepedia

Author

R. Lin

University of California, Berkeley

Also Known As

R. F. LIN, R. F. Lin, R. Lin, R.F. Lin, Ronald Lin, Ruomeng Lin

30

Publications

1.2K

Citations

12

H-Index

33

Concepts

All Affiliations

University of California, Berkeley Hodges University Semiconductor Manufacturing International (Italy)The University of Texas at Austin Yale University

RL

About

R. Lin is an author at University of California, Berkeley specializing in engineering, applied physics, and electrical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	11	620
2	Applied Physics	7	7	400
3	Natural Sciences	4	4	735
4	Chemistry	4	4	307
5	Chemical Engineering	1	1	62

R. Lin

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12

Publications

1.2K

Citations

12

H-Index

	Year	Citations
An exceptionally bright flare from SGR 1806–20 and the origins of short-duration γ-ray bursts K. Hurley, Steven E. Boggs, David M. Smith, Nature Short-duration γ-Ray BurstsPhysicsNatural SciencesAstrophysical PlasmaPrompt Emission	2005	556
An adjustable work function technology using Mo gate for CMOS devices R. Lin, Qiang Lu, P. Ranade, IEEE Electron Device Letters Low-power ElectronicsMo Work FunctionElectrical EngineeringSemiconductor TechnologyEngineering	2002	188
Surface structure of coadsorbed benzene and carbon monoxide on the rhodium(III) single crystal analyzed with low energy electron diffraction intensities M.A. Van Hove, R. Lin, G.A. Somorjai Journal of the American Chemical Society Materials ScienceSurface CharacterizationCoadsorbed BenzeneSurface StructureEngineering	1986	128
LEED intensity analysis of the structure of coadsorbed benzene and CO on Rh(111) R. Lin, G. S. Blackman, M.A. Van Hove, Acta Crystallographica Section B Structural Science Coadsorbed BenzeneEngineeringOrganic ChemistryComputational ChemistryChemistry	1987	95
The adsorption of benzene and naphthalene on the Rh(111) surface: A LEED, AES and TDS study R. Lin, R.J. Koestner, M.A. Van Hove, Surface Science Chemical EngineeringTds StudyEngineeringSurface ChemistryNatural Sciences	1983	62
Metal gate work function adjustment for future CMOS technology Qiang Lü, R. Lin, P. Ranade, Mo Work FunctionElectrical EngineeringEngineeringVlsi DesignNanoelectronics	2002	41
Effects of high-κ dielectrics on the workfunctions of metal and silicon gates Yee-Chia Yeo, P. Ranade, Qiang Lü, Interface Dipole TheoryElectrical EngineeringEngineeringNanoelectronicsBias Temperature Instability	2002	23
Low-energy electron diffraction study of multilayer relaxation on a Pb{001} surface R. Lin, Y. S. Li, F. Jona, Physical review. B, Condensed matter Materials ScienceFirst Interlayer SpacingMultilayer RelaxationSurface CharacterizationSecond Interlayer Spacing	1990	23
Disordered asymmetrical surface structures of clean Mo(100)-“(1 × 1)” and of “c(2 × 2)” sulfur on Mo(100) from dynamical leed analyses Dan Kelly, R. Lin, M.A. Van Hove, Surface Science Clean MoSurface CharacterizationEngineeringPhysicsNatural Sciences	1989	22
Molybdenum Gate Electrode Technology For Deep Sub-Micron CMOS Generations P. Ranade, R. Lin, Qiang Lü, MRS Proceedings Low-power ElectronicsElectrical EngineeringEngineeringNanoelectronicsApplied Physics	2001	13

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